Used VARIAN E19000430 #9236780 for sale

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ID: 9236780
Filament power supply Rev. 4.
VARIAN E19000430 is an advanced ion implanter and monitor developed by VARIAN Inc., a world leader in the supply of semiconductor production equipment. Although primarily designed for semiconductor manufacturing, the implanter is also widely used in medical research and other industrial applications. E19000430 is an automated ion implanter and monitor with a wide range of capabilities. It has excellent good repeatability and durability, and is designed to handle a variety of implant profiles. The equipment is capable of delivering both low energy (< 500 keV) and high energy (up to 20 MeV) implants at high throughput rates. It features advanced beam control software that enables the user to precisely control the dose, energy, fluence, and trajectory of the beam. VARIAN E19000430 provides a variety of monitoring and control functions that allow the user to monitor all aspects of the implant during operation. These include computer based diagnostics, data storage, and log files. A special internal beam alignment system helps to quickly line up the implant profile in order to achieve superior implant performance. The unit is also capable of performing ion thruster experiments, which can be used to effectively increase implant processing speed. Ion thrusters are a type of technology that uses charged particles to propel items through an evacuated tube. This can be used to increase the speed of ion implantation by creating a beam that is up to six times faster than the traditional implantation process. The user interface is extremely user friendly, with a graphical icon based navigation machine. This allows for easy access to all tool functions. E19000430 also has a self-diagnostic feature, which automatically monitors all major asset components. The model is also designed to be easily expandable, allowing for a variety of add-on components to be installed. All of these features make VARIAN E19000430 an ideal choice for both industrial and research applications. It provides reliable implant profiles with reduced downtime, as well as increased speed and efficiency. The advanced control capabilities, and its flexibility make E19000430 a top choice for advanced implantation and monitoring.
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