Used ACCRETECH / TSK UF 200S #9283852 for sale

ACCRETECH / TSK UF 200S is a prober that offers a distinct advantage for users in the semiconductor and optoelectronic device production industries. TSK UF200S is capable of measuring and verifying structures with dimensions from 3μm up to 34μm, making it a great tool for a variety of applications, including failure analysis and characterization, process evaluation, and research and development. ACCRETECH UF 200 S features a new 4-axis design that allows users to simultaneously measure contact resistance and capacitance, which is ideal for testing larger or complex structures where many measurements need to be taken. Additionally, the prober offers both large and small probing area options, with a choice of 500μm or 6mm. Both areas come with a large selection of probes and adapters, as well as interchangeable and moveable grids, to cover a wide range of probing needs and applications. ACCRETECH / TSK UF 200 S is also highly reliable and accurate, with sub-micrometer resolution capabilites. The prober uses an automatic visual alignment system and a unique XYZ and XYZ' Motion Center software to proactively optimize alignment and reduce contact force variability. Furthermore, the system is able to recognize the width of lines, conductors, and spaces, automatically calculate the width and misalignment, and provide feedback results in real time. In addition, ACCRETECH UF 200S is a user-friendly system, with a large touch screen HMI that provides simple menus, user-friendly graphs, and intuitive operation for day-to-day use. It also has an integrated Disk Drive Capacity Interface (DDI) which allows users to store data to removable disks or network servers, or to import and export it with a USB interface. Overall, TSK UF 200S Prober is an excellent choice for studies of a variety of semiconductor and optoelectronic device applications. Its highly reliable performance and user-friendly interface make it ideal for failure analysis, process evaluation, and research and development.