Used SEMICS Opus II #9407031 for sale

SEMICS Opus II is an advanced metrology prober for measuring electrical performances of active and passive components. The prober is capable of measuring across a wide range of electrical parameters including temperature, voltage, capacitance, line impedance, frequency, current, and resistance. With its combination of high accuracy and wide range of measurement capabilities, Opus II is suitable for a variety of tasks such as testing for Mask-Level Completion Verification, Lot-to-Lot Verification, and Process Characterization. The prober is composed of two main components, the actual measurement device and a computer interface. The measurement device integrates a motion system, which controls the adjustable X and Y axis, and the tip which is used to probe the wafer and send measurement signals. The motion system is powered by precision linear motors, allowing for improved accuracy, speed and resolution. The prober is then built with specialized software designed specifically for its purpose, allowing technicians to easily control and program the device as well as collect measurement results. In addition, SEMICS Opus II also has several built-in capabilities that offer flexibility and enhance its performance. An auto-leveling system allows for alignment of the tip for improved accuracy, and auto-detection features help the prober identify connections and begin the measurement process automatically. The prober also utilizes multiple communication protocols such as Ethernet, USB, and GPIB, which allows for easy integration with external hardware as well as improvement of throughput. Overall, Opus II prober is a powerful and versatile tool suitable for a wide range of electrical characterization tasks. Through its combination of automated features and specialized software, it is able to collect measurements across a range of electrical parameters with impressive speed and accuracy. The wide range of communication protocols also allow for easy integration with external hardware, which greatly increases its versatility and the overall throughput of measurements.