Used SEMICS Opus II #9407037 for sale
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SEMICS Opus II is a semiconductor analysis prober developed by sMicron. It is a high-end, mass-production solution designed to accurately measure the electrical properties of semiconductor wafers and chips in modern production lines. Its advanced design has made it one of the most reliable and accurate probers available on the market. Opus II consists of various components that enable it to accurately measure a wide range of electrical properties. Its core components include a wafer handling equipment, wafer probing system, optical unit and alignment machine. The wafer handling tool is designed to securely move wafers between the probing station and the optical asset. This model also has advanced capabilities for precision sensing and control to ensure accurate wafer placement. The wafer probing equipment provides a consistently high level of accuracy. It features an advanced Z-stage and X-Y stage with a probing force range from 500 μN to 10N and a probing force accuracy of 0.1 μN. The Z-stage is also equipped with a set of interchangeable contacts to accommodate a variety of different probing technologies. The optical system is the centerpiece of SEMICS Opus II prober. It features two digital microscopes that can be used independently or together to capture images of wafer surfaces in detail. This unit also uses an integrated scanner to detect outlier point defects and inspections. The alignment machine of Opus II is also designed to provide a high level of accuracy. It uses an automated alignment tool to accurately determine the alignment of the wafer with respect to its probing surface. This asset can store up to 10 alignments, making it ideal for efficiently performing multiple measurements. SEMICS Opus II prober is an advanced model that provides precise electrical measurements. It features an intuitive, user-friendly interface that allows operators to quickly and accurately measure and analyze wafers in a production environment. This prober has been designed to meet the needs of implementation in high-volume semiconductor manufacturing operations.
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