Used PFEIFFER / BALZERS TCP 300 #9000822 for sale

PFEIFFER / BALZERS TCP 300
Manufacturer
PFEIFFER / BALZERS
Model
TCP 300
ID: 9000822
Turbo molecular pump 50 to 1500 l/s Control only Solid state control, no cables.
PFEIFFER / BALZERS TCP 300 is a hybrid turbomolecular pump designed for ultrahigh vacuum applications. Its hybrid spiral design combines the advantages of the helical rotor pump with the free-streaming capability of the molecular drag pump to achieve ultimate performance. The low-noise design of the pump provides a quiet environment even at the highest pumping speeds. The unique features of BALZERS TCP 300 include a higher allowed operating temperature of up to 100°C, a low end-cutoff of less than 5 x 10⁻² Torr, a pumping speed of 300 l/s, a forevacuum connection of DN 16 KF, and an High Operating Efficiency (HOE) motor and Redundant Inverter (RI) to ensure maximum performance. It's also capable of tolerating sudden vacuum fluctuations and start-stop cycles without compromising its pumping performance. PFEIFFER TCP 300 utilizes a three-stage Turbopump with an inboard bearing for greater stability. Its single housing keeps all the components of the pump in the same unit for improved pump performance and easy installation. The pump's unique hermetically sealed spacerless construction prevents dirt from entering and relies on minimal maintenance. The pump features a wide range of accessories such as process connections and exhaust valves that allow the user to choose the type of installation best suited to the application. TCP 300 guarantees a peak performance at a low cost due to its long working life and its low power consumption. Its advanced design allows it to start in no-load condition, even at maximum pressure to provide easy operation. The provided monitoring and control electronics further facilitates its control. The robust and reliable design of the pump enable the user to clean the pump while running and reduce the downtime. Ultimately, PFEIFFER / BALZERS TCP 300 pump is an excellent choice for applications that require an ultrahigh vacuum. It provides a suitable solution for processes where vacuum performance and reliable operation are paramount such as in processes within the semiconductor and electronic industry, analytical sciences, research laboratories, and space simulation.
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