Used TEL / TOKYO ELECTRON Unity EP #9283079 for sale
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TEL / TOKYO ELECTRON Unity EP (also known as an etcher/asher) is a highly advanced plasma based etching and ashing equipment for rapid, clean and uniform sample processing. It combines the capabilities of plasma etching and ashing, a process that removes material in order to create microelectronic devices, into one compact, automated unit. TEL Unity EP utilizes the power of a hollow cathode dielectric barrier discharge (HDBD) plasma source to achieve high etching rates and substrate selectivity. This technology is designed to work in both wet and dry processes, giving users the flexibility to process different types of samples. The platform is based on an intuitive open architecture and provides fully programmable control over all processes. TOKYO ELECTRON UNITY-EP also features an intuitive user interface and a graphical display that allows users to monitor and monitor etching and ashing process parameters. This system can be used to pattern circuit boards at a 10 micron or greater resolution and etch through 0.5mm materials. TOKYO ELECTRON Unity EP unit is optimized for integrated circuit (IC) production and offers several features that facilitate IC fabrications. For example, the machine is equipped with a quartz substrate holder that enables high temperature operation and is suitable for use with etching gases such as nitrogen, argon, oxygen, and argon-oxygen mixtures. It can also achieve a high etching rate over a wide range of parameters. The platform also includes several safety features such as gas detection, over-pressure protection, and an inert gas cycle. Additionally, the tool is equipped with an ion trap which is used to reduce the instability of the plasma source during plasma etching processes. This feature ensures reliability and reproducibility in the etching process. Unity EP also features a high degree of flexibility and supports a wide range of etching chemistries and substrates. It is able to process both non-conductive and conductive materials, such as polymers and metals, and is suited for etching a variety of vias, contact holes and features on a substrate. Its large asset volume also enables users to easily accommodate large substrates while simultaneously etching multiple samples. Overall, UNITY-EP is a powerful and versatile etching and ashing model that's capable of handling a wide variety of substrates and etching processes. With its advanced capabilities and intuitive design, it's an ideal tool for rapid, clean and uniform sample processing in the IC fabrication industry.
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