Used FEI TEMLink 14471-001 #9215703 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
FEI TEMLink 14471-001 wafer & mask scrubber is a full-featured and highly automated workstation designed to simplify and enhance the cleaning of wafers and photomasks used in the semiconductor industry. This scrubber can efficiently and accurately clean multiple substrates including semicons, quartz, glass and photomasks with minimal manual handling. The system comes with a vacuum chuck to hold wafers in place during the cleaning process. The chuck is controlled by an integrated automated controller, allowing for programming of parameters such as scrubbing angle, solution type, and dwell time. The scrubber also offers manual override modes for manual operation. TEMLink 14471-001 also features an easy-to-use user interface with touch control and program memory, allowing for easy recipe creation, storage, and retrieval. These recipes can be quickly tuned to the specific parameters needed for each cleaning job. The solution reservoir has enough space to accommodate two different cleaning solutions, allowing for fast and effective cleaning while reducing waste. The scrubber also has a built-in humidifier to help reduce surface defects, static charges, and debris. Additionally the system is designed to minimize noise and vibration, ensuring operator comfort when in use. The scrubber is designed to operate without manual intervention for extended periods of time, making it an ideal solution for busy production lines. The scrubber can accommodate substrates up to 200mm in diameter and is housed in a small footprint for easy integration into a variety of production and cleanroom environments. FEI TEMLink 14471-001 is an automated, easy-to-use, and highly reliable scrubber designed to enhance wafer and mask cleaning and reduce manual intervention in the process. It is an ideal choice for semiconductor manufacturers requiring fast and consistent cleaning of substrates in a wide range of environments.
There are no reviews yet