Used KLA / TENCOR EV300 #9088175 for sale
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ID: 9088175
Scanning Electron Microscope (SEM), 6"-12"
Fully automated
Designed specifically for high-volume review and analysis in a manufacturing environment
Integrated automatic defect classification (ADC) capabilities
Flexible tilt/rotation
Voltage contrast review
High aspect ratio interconnect (HARI) imaging
Landing energy up to 19 keV: enables unambiguous material identification
Engineering analysis applications for 0.13 micron and smaller design rules
Unpatterned and patterned wafer inspection system
Klarity Defect automated analysis and defect data management system: analysis, defect control, and excursion monitoring.
KLA / TENCOR EV300 is a high-precision mask and wafer inspection equipment designed to identify defects in metallization. It uses a combination of advanced optical techniques, including brightfield and dark field imaging, as well as patented multiangle scatter imaging technology, to detect and characterize critical defects. With a scanning range of up to 300mm, KLA EV 300 can capture a wide range of defect types, including those in pre-metal and metal layers of photomasks. The system consists of a wide-field high-resolution infra-red camera, which provides a quick and accurate overview of the entire wafer, and several optical detectors, which give detailed images of the defects present. Its high scan resolution, up to 10µm, allows for the detection of fine particles, such as particles from etch or oxide layers, as well as for effective distinguishes between particles of different sizes and shapes. The scan speed of the unit, which can reach up to 5 Hz, ensures quick process times. TENCOR EV-300 can be used to check for defects in the shape, size, and position of contact pads, vias, and lines, as well as on the corners and edges of pads. It can also be used to identify excess oxidation, contamination, as well as scratches or topographical variations in the depositions. The machine has several integrated automated image analysis features, that significantly reduce the need for manual inspection and interpretation. TENCOR EV300 comes with an intuitive user interface, making it easy and user-friendly to operate. It is compatible with all major fab processes, allowing for easy integration and fast startup. The tool also supports a full range of IT tools for pre and post process analysis and reporting. By using cutting edge technologies, TENCOR EV 300 can help fabricators quickly identify and locate chemically marked particles, which are critical to the success of advanced lithography. All in all,KLA / TENCOR EV 300 is an advanced mask and wafer inspection asset that revolutionizes the way defect analysis is performed. With its high resolution, automated image analysis features, and user-friendly interface, KLA EV300 is the perfect choice for identifying critical defects in metallization.
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