Used PHILIPS / FEI Nova NanoLab 600 #9261304 for sale

PHILIPS / FEI Nova NanoLab 600 is a dual beam, ion milling equipment designed for various nanofabrication applications. It has an advanced optical design, allowing for precise delivery of an intense beam of ions in three dimensions. The system utilizes an integrated electrostatic beam-deflection unit to accurately position the beam to any desired target on the sample surface. The ion beam used by the NanoLab 600 is generated by an ion source, which can be configured with either a metal or gas ion source. The metal ion source uses a DC arc to generate a low-energy metal ion beam, such as tungsten or gold, that can be used for high aspect-ratio etching or nanomilling. The gas ion source uses an RF plasma to generate a gas ion beam that can be used for high precision patterning or nanoimpression applications. The NanoLab 600 has a powerful analytical machine built in to enable semiconductor characterization of samples before and after etching. The tool utilizes an integrated scanning electron microscope (SEM), electron backscatter diffraction (EBSD), energy-dispersive X-ray (EDX) spectrometry, and transmission electron microscope (TEM) to more accurately characterize and control the etching process. The integrated SEM can also be used for in-situ observation of the sample during etching. The NanoLab 600 has an intuitive control interface which allows for easy setup and operation of the asset. The user can program a wide variety of nanofabrication tasks, such as etching and milling, with the intuitive graphical user interface. The model also offers real-time analysis of the etching process as well as a suite of post-processing tools for further analysis. The NanoLab 600 is a powerful equipment offering excellent ion milling and nanofabrication capabilities. It can be used for a variety of applications, ranging from semiconductor device fabrication, nanotechnology, and microelectromechanical systems (MEMS). Its integrated analytical system, intuitive user interface and wide range of capabilities make it an ideal unit for nanofabrication applications.