Used RIBER 401-1000 #293600163 for sale

Molecular beam epitaxy (MBE) is a revolutionary method for the fabrication of high-quality semiconductor materials. RIBER 401-1000 is a molecular beam epitaxy equipment that is used for the growth of high-quality thin films. It can be used for producing a variety of compound substrates with atomic-scale thickness. To achieve this, the system uses a process involving multiple sources and a growth chamber. On the source side, four separate independent sources - electron beam evaporator, solid organometallic source, solid metallic source and gas cracking - are available. All sources are controlled through a powerful computer interface, offering a range of possibilities for material control and sample homogeneity. The heated electron beam is used for evaporating the materials, while the solid organometallic and metal sources contain reagents and dopants, which can be introduced into the growth chamber, while the gas cracking source is suitable for materials that require splitting. The growth chamber is equipped with adjustable temperature, pressure and flow control, with an in-situ thermal processing option and several convenience features, such as fast pipe warming and automatic shutter positioning. This provides a comprehensive range of possibilities for material control and high homogeneity of the substrate. The unit also contains a temperature-controlled exhaust-gas purification chamber, which guarantees that only very low levels of impurity are present in the growth chamber, leading to the production high-quality materials. Built with a compact frame and low vibration, 401-1000 is designed for growth of both pure and doped semiconductor materials, and can deliver a wide range of substrates, from metals to alloys to monocrystalline substrates. This machine is a great choice for the fabrication of advanced semiconductor devices, offering superior control over the structures, dopants, and defect densities produced during device fabrication. Its low vibration platform ensures that high quality materials and devices can be produced without any distortion or defect formation, while its in-process spectral analysis and detection tool allows for rapid characterization and monitoring of the production process. It is an excellent tool for research and production applications.