Used CAMECA IMS 4F #9210239 for sale

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Manufacturer
CAMECA
Model
IMS 4F
ID: 9210239
Vintage: 1988
SIMS System Includes: Oxygen duoplasmatron source Microbeam Cs+ source with a lens Primary beam mass filter NEG for charging neutralization Electronic units with some modifications: (3) Fore pumps (4) Turbo pumps (2) Cryo pumps (2) Ionic pumps 1988 vintage.
CAMECA IMS 4F is a Secondary Ion Mass Spectrometer (SIMS) designed to analyze the composition of surfaces and thin layers down to 100 nanometers. It is equipped with a 2.5 kilovolt (kV) field free ion source, 4-detector mass separator, and a sample chamber designed to facilitate the analysis of samples under ultrahigh vacuum. The 2.5kV field free ion source uses a light collimation system to focus scanned imaging ions and achieve a near perfect distribution of focused ion beams. This allows high resolution imaging with a precision of approximately 1 nanometer. The ion source consists of four focusing electrodes which can be individually adjusted to vary the scanning area and resolution. The four-detector mass separator consists of two magnets, two quadrupole rods, and a pair of combined field plates. This combination of components is capable of accurately measuring the mass-to-charge ratios of ions extracted from the sample. The signal from each of the four detectors is independently measured and the combined signal is converted to total ion counts for each mass-to-charge range. The sample chamber, designed for ultrahigh vacuum conditions, can accommodate a wide variety of sample types and geometries and is well suited to analyzing the composition of surfaces and thin layers. For imaging analyses, the sample chamber is mounted on a motorized three-dimensional sample stage. This allows for a wide range of sample handling and manipulation, including the ability to scan large areas of the sample quickly and accurately. The sample stage is controlled by an integrated software package, which can control sample rotation, tilt, and focus. CAMECA IMS4F is capable of performing a variety of analyzes, including depth profiling, isotopic analyses, secondary ion imaging, and surface composition analysis. This powerful combination of capabilities gives the user the flexibility to accurately measure the composition of surfaces and thin layers in a cost-effective and reliable manner.
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