Used PERKIN ELMER Plasma 400 #9092097 for sale

PERKIN ELMER Plasma 400 is a high resolution, mid-pressure optical emission spectrometer with a range of performance features that make it suitable for a wide range of applications. With a double-dispersion grating, a wavelength range from 175 to 900 nm, and spectral resolution of 0.3 nm, it can detect any desired element with excellent sensitivity and accuracy. The unique Multi-Label operation and multiplex capabilities make it ideal for simultaneous element analysis and multi-component studies, and its powerful software provides dedicated tools for advanced and expanded capabilities. The laboratory-grade instrument with a probe-based design is perfect for routine analyses, providing accurate results and unparalleled analytical performance. Plasma 400 includes advanced emission optics, high-resolution spectral data, and an optimized wavelength selection system. Its automated optical system self-aligns and precise positioning is guaranteed thanks to advanced signal management and data processing algorithms. PERKIN ELMER Plasma 400 has an intuitive and flexible user interface, which allows access to powerful analytical functions with minimal effort. It includes all the necessary tools for conducting analyses, such as cutting-edge software applications, laboratory-quality closed-loop control, and data management and transfer. Plasma 400 is offered with a self-sustaining PC which combines hardware and software. This user-friendly instrument includes an internal fan that enhances cooling performance, ensuring extended period of operation without further expenditure. The innovative NIR extendability option significantly improves sensitivity for detecting oxygen, nitrogen, and other gases via spectral lines in the near infrared region. This spectrometer also includes an automatic sample inlet for easy sample introduction, and an integrated chromatography line-feeder for pre-separation of extended sample material. PERKIN ELMER Plasma 400 has multiple anti-interference strategies to reduce interference noise and error peaks. Its advanced signal processing algorithms significantly improve detection capabilities, allowing users to obtain low investment analytical solutions with excellent performance. And with a small footprint, advanced shielding methods, highly efficient cooling, and excellent regulation system, Plasma 400 provides superior operation stability, even when measuring samples with high background radiation. It meets the highest requirements for performance and quality, ensuring that each analysis is reliable, reproducible, and traceable to laboratory standards.