Used ACCORD 400 #9185112 for sale

ACCORD 400 is an automated wafer and mask scrubber developed by SemiTEq Inc. for use in semiconductor device fabrication. This tool is designed to quickly clean wafers and masks using a special rotating brush that works in a high throughput environment. The drive equipment of the unit uses a closed-loop design that allows the brush to operate in precise and repeatable motion with little or no drift. The control system of the unit is designed to provide a user interface as well as an easy way to set up and control the machine. 400 wafer and mask scrubber utilizes a dual brush cleaning unit. The main cleaning brush uses high speed and low-vibration horizontal movement to scrub and remove particles, dust, and oils from wafers, masks, and wafer frames. The secondary brush is designed to remove any residual particles and fluids not completely removed by the primary brush. This prevents wafer erosion and protects the circumferential area from contamination. Selected wafers and masks can be inserted manually or by using a robotic arm into the scrubber chamber. Once the airtight seals are in place, the user can start the scrubbing process using the user manual or the control machine. ACCORD 400 operates in a fully automated mode and user can adjust parameters such as brush speed and duration to ensure a thorough cleaning process. With a brush tension of up to 4 grams, the scrubber removes particles at highest efficiency as well as reduce unnecessary wear on the scrubbing rods. The scrubber also allows for an adjustable air volume between the wafer and the brush head that ensures an optimal scrubbing efficiency. This chamber is equipped with a hermetically sealed filtration tool to capture, retain, and finally expel all dirt particles, resulting in clean wafer surface. The large-cavity filter also reduces the risk of particle contamination. The tool is fitted with a moderate weight and noise level and is energy-efficient. 400 is a highly intuitive and reliable scrubbing machine designed to meet the stringent wafer and mask cleaning requirements of a semiconductor device fabrication environment. Equipped with a range of programmable settings, the user can adjust brush speed, air volume, and other parameters to quickly and effectively clean wafers and masks. The scrubbing machine is ideal for quick and efficient cleaning applications in both commercial and industrial settings.