Used ACCORD 400 #9355546 for sale

ACCORD 400 is a wafer and mask scrubber that is designed for high-volume wafer and mask cleaning applications. It is capable of scrubbing and drying wafers up to 18-inch diameter and masks up to 25-inch x 32-inch in size. The scrub-capable surface of the scrubber is made of corrosion-resistant stainless steel, while the interior is composed of a rugged, abrasion-resistant, thermally stable plastic. The scrubber is also equipped with air intakes and outlets for efficient air circulation and cooling. 400 wafer and mask scrubber is equipped with a powerful four-motor array that was designed to provide uniform scrubbing and drying capabilities. Each motor can be adjusted to vary the speed and force of the scrubbing process while keeping the overall scrubbing and drying duration low. The scrubber also features a height-adjustable scrub-capable surface that can be adjusted from level 13 to level 3.5. The adjustable height helps to create environmental enclosures that provide superior protection against dust, particle and contaminant infiltration into the wafer or mask bath. The scrubber also features a two-stage filtration equipment comprising of a chemical filter and a high-efficiency particulate air (HEPA) filter. The chemical filter removes chemical particulates and other contaminants while the HEPA filter removes sub-micron particles and other contaminants. Both filtration stages are designed to create a near-sterile environment for the scrubbing and drying process. And, to ensure the highest level of scrubbing and drying performance, the scrubber is equipped with a self-cleaning cycle that automatically clears out any built-up contaminants from the filtration system. In addition, ACCORD 400 wafer and mask scrubber features an automated chamber door opening and closing unit as well as an audiovisual alarm machine. This ensures efficient operation and alert personnel in the event of chamber overloading, power interruption, or errors in programming. 400 is a highly reliable wafer and mask scrubber that is designed to provide consistent, reliable and powerful cleaning performance. It is an ideal scrubber for high-volume wafer and mask cleaning applications.