Used ACCRETECH / TSK A-CS-100A #9100956 for sale

ACCRETECH / TSK A-CS-100A is an advanced wafer and mask scrubber. It is a highly efficient, robust, and reliable machine designed for materials on any type of wafer and substrate surfaces. The scrubber uses two high-pressure nozzles to spray a detergent solution onto the surface of the wafer or substrate. The detergent mixture is designed to remove contaminants like dust, debris, and other contamination that can expose the wafer or substrate to potential damage. The nucleation system is designed to reduce bubble formation and reduce foam on the surface of the wafer and substrate. TSK A-CS-100A scrubber is designed to work with all types of thin films and wafers, including MEMS (Micro-Electro-Mechanical Systems), Photomasks, and masks used in semiconductor processing. It is a precise instrument designed for task critical applications, such as those used in the electronics industry. The scrubber is protected from environmental contamination by the high-quality air curtain that protects both the interior of the scrubber and the external surfaces. ACCRETECH A-CS-100A scrubber uses a 300 watt high-pressure motor to propel a variety of detergents and cleaning solutions to remove particulate matter (dust and dirt) from the wafer and substrate surface. This removes any trapped particles that can interfere with the process or damage the quality of the wafer or mask. The scrubber is equipped with a flow control valve for precise adjustments to the performance settings and manual override capabilities. The scrubber is spec'd out with a simple-to-use controller, a digital timer, and a temperature indicator to ensure precise control of the scrubber's performance. The temperature indicator is adjustable for different types of substrate materials and is adjustable to within one degree for each wafer or substrate material. This adds to the accuracy and efficiency of the scrubber's performance. A-CS-100A is designed for manual operation at 5.5 liters/minute, with a 6.5 liter/minute mode available for industrial and semiautomatic operation. The manual cycle also has an adjustable pressure setting, allowing for greater precision and control. The scrubber also features a spray-pulse technology and a unique onboard waste collection system for collecting and managing the waste and rinse water generated by the scrubber's cleaning process. ACCRETECH / TSK A-CS-100A scrubber is a powerful, user-friendly, and well-designed machine. Its broad range of features and settings make it ideal for a diverse range of industries and applications. From semiconductor mask cleaning to MEMS wafer cleaning, the scrubber is built to meet the most demanding applications. The scrubber is designed for easy maintenance and cleaning, making it a great choice for maintaining quality and the effectiveness of the wafer and substrate cleaning process.