Used ACCRETECH / TSK A-CS-100A #9100958 for sale

ACCRETECH / TSK A-CS-100A
ID: 9100958
Vintage: 2007
Manual spin cleaner, 4"-8", 2007 vintage.
ACCRETECH / TSK A-CS-100A Wafer & Mask Scrubber is an all-in-one robotic scrubbing tool designed to clean semiconductor wafers and masks without harming them or producing hazardous substances. It can be placed in a glovebox, lab, or production environment, so it can be used in a variety of operations. The equipment utilizes two scrub arms and a water resistant frame that are designed to provide simultaneous scrubbing to both sides of the wafers and masks. The arms are equipped with silicone scrubbers, which can scrub the wafers and masks while protecting the delicate materials from damage. The scrubber is connected to a PC that can control the exact pressure and speed of the scrubbing, as well as other parameters, ensuring precise cleaning results. This PC also serves as the interface to the scrubber, giving users the ability to set predetermined scrubbing patterns or to manually perform functions such as wafer loading and returning. Moreover, the scrubber is equipped with an automatic wafer-throwing mechanism that is designed to remove contaminated wafers from the scrubbing frame. TSK A-CS-100A's cleaning capabilities are further enhanced by a built-in drying system, which uses a series of air knives that can quickly and efficiently dry the wafers and masks after scrubbing. This not only reduces the time it takes to clean the components, but it also ensures that all residual water has been removed from the wafers and masks, preventing them from sustaining water damage or other types of contamination. Finally, ACCRETECH A-CS-100A also comes with a robust monitoring unit, which can be used to display the scrubbing condition of the wafers and masks. This data can also be exported via USB to an external PC for further analysis, helping to ensure that every wafer and mask is squeaky clean. In conclusion, A-CS-100A is a highly advanced robotic scrubbing machine that is capable of cleaning semiconductor wafers and masks with great precision and efficiency. It is designed to protect the delicate material from damage, and its built-in drying tool and monitoring features make it the ideal tool for scientific research and production environments.
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