Used ATTO ATS 601-AT #9249407 for sale

ATTO ATS 601-AT Automatic Wafer and Mask Scrubber is an automated precision tool designed to quickly and effectively scrub and clean all types of wafer and mask materials. Ideal for optimisation of post-processing cycles and cleaning up after sawing operations, this scrubber guarantees precision, reliability, and repeatability for optimal particle removal. ATS 601-AT uses a high-pressure fluid system combined with ultra-sonic transducers to create a powerful, safe and effective scrubbing method to remove particulate matter, oxide, dust and other contaminates from the surface of wafers and masks. The scrubber offers adjustable pressure, frequency and volume, as well as operator-controlled scrub heads made with PTFE, which are specifically designed to not damage the surface of the wafer and mask. The scrubber features advanced programming for unattended operation, allowing for running multiple scrub areas at once for optimal cleaning. Its built-in connection ports enable integration with network systems for improved process control. ATTO ATS 601-AT also offers an advanced control system and built-in safety features. This scrubber's design is robust and spacious, with a generous two-foot by three-foot stainless steel work deck. Its reinforced bearings and rigid steel construction ensure superior stability and precision during operation. It's also designed for low noise and vibration, creating a quiet and comfortable work environment. ATS 601-AT is also energy efficient, making it highly economical to operate and extremely reliable, and maintenance-free to ensure minimal downtime. Additionally, it meets all European safety standards making it ideal for cleanroom applications. ATTO ATS 601-AT performs wafer and mask scrubbing faster than other models, giving owners guaranteed efficiency in post-processing cycles and particle removal, all while being energy efficient and designed to be used in a wide variety of working environments. It offers specialised solutions based on the demands of the application, and its superior features make it an ideal choice for scrubbing all types of wafer and mask materials.