Used BOC EDWARDS System #9038519 for sale

BOC EDWARDS Equipment is a wafer and mask scrubber designed to efficiently clean a variety of surface contaminants from semiconductor-grade wafers and masks. System includes a series of jet sprays, hot water tanks, and chemical concentrators converting tap water into deionized water. It can clean up to 20 wafers or 12 masks at a time, with a cleaning cycle time of less than 17 minutes. BOC EDWARDS Unit begins with a Jet Spray Area utilizing up to 10 cleaning nozzles. This area is designed to fully remove all types of dirt, grit, dust, and other surface residue. The wafers and masks pass under the jet spray which are carefully designed to ensure maximum coverage. Following the Jet Spray Area is an automated Hot Water Tank. This is used to further clean and rinse off any residues that remain. This tank is also outfitted with a circulating water pump to continually disappear the chemical concentration in the water.Machine then moves to a Chemical Concentrator where ultra-filtered tap water is converted to chemical-free, deionized water. This water is preheated and then pumped back into the Hot Water Tank. From there the wafers and masks are transported to the Air Knife Dryer. This dryer utilizes high-speed continuous air streams to thoroughly dry the wafers and masks, leaving them free of moisture. The final stage in BOC EDWARDS Tool is the Ozone Rinse Module. This module introduces ozone (O3) into Asset, which acts as an antifogging agent, while also providing an extra layer of cleanliness. It destroys bacteria and organic compounds while providing additional sanitation benefits. To ensure safety and efficiency while operating BOC EDWARDS Model, a programmable logic controller (PLC) is included. This allows for easy troubleshooting, an automated data-logging Equipment, and easy remote monitoring. To further increase safety, BOC EDWARDS System also features an on-board computer control Unit for alarm and override functions. BOC EDWARDS Machine is an efficient, reliable, and easy-to-use wafer and mask scrubber suitable for a variety of applications. By combining a series of powerful jet sprays, hot water tanks, chemical concentrators, and an ozone rinse module, Tool is capable of cleaning up to 20 wafers or 12 masks in less than 17 minutes, while avoiding unnecessary residue. Additionally, the automated on-board computer control adds an extra layer of safety and security, while also making it easier to troubleshoot and remotely monitor operations.