Used C-SUN PRS #9271179 for sale
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ID: 9271179
Vintage: 2010
Scrubber
Material of chamber: Aluminum alloy whit surface treatment
Inner chamber: Ø 380 mm x H 305 mm
Application of solar cell:
Edge isolation
Texture
Inductively Coupled Plasma (ICP) source
RF Generator: 13.56 MHz, 1000 W
Standard gas: O2
Gas flow control: Analog type MFC
Dry pump: >150 m³ / hr
Base pressure: >10^-2 Torr
Process pressure: 50~200 m Torr
Automatic system: 15" TFT Panel / IPC / Windows 2000 XP
2010 vintage.
C-SUN PRS is a wafer & mask scrubber designed for use in semiconductor fabrication laboratories. It uses a strong detergent-diluted water-air mixture to dissolve particles and contaminants present on the wafer and mask surface. The scrubber not only removes particles but also provides effective degreasing to restore surfaces to their intended surface chemistry. PRS is a rugged equipment utilizing a platform-style scrubber. Its large hopper capacity allows for up to 45 wafers and up to three masks to be processed in one cycle. C-SUN PRS is equipped with adjustable nozzles and spray headers to precisely deliver the cleaning solution. The scrubber's recirculating system ensures that the cleaning solution is constantly circulated, providing a uniform cleaning even when dense particles are present. Additionally, a powerful pump is used to inject high-pressure liquid to the wafers and masks, effectively dislodging stubborn particles. The unit is housed in a stainless-steel enclosure with a wide-open lid for easy accesswhich allows for rapid and clear visual inspection of the components. It runs on three-phase power at 415V and is capable of running for over 2000 cycles and 200 continuous hours of use. The water and detergent are automatically monitored to ensure their levels are not too high or too low. The optional integrated filtration machine also allows PRS to eliminate dissolved particles from the recirculated cleaning solution and improve its effectiveness. C-SUN PRS is a fully automated tool, allowing for greater flexibility and convenience for its operators. PRS runs through complete cleaning cycles without the need for further intervention or adjustment after loading the wafers and masks. It is also equipped with user-friendly software that allows users to monitor and control its parameters with convenient and intuitive data acquisition. C-SUN PRS meets the industry's stringent standards in terms of particle removal, cleanliness, and cost efficiency. Its sturdy construction makes it impervious to wear and tear, and its automated functions make it cost-effective and easy to use. Its user-friendly software and wide-open lid design make it a great choice for semiconductor fabrication labs looking for a reliable and accurate wafer and mask scrubber.
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