Used C-SUN PRS #9283776 for sale
URL successfully copied!
Tap to zoom
ID: 9283776
Vintage: 2010
Scrubber
Material of chamber: Aluminum alloy whit surface treatment
Inner chamber: Ø 380 mm x H 305 mm
Application of solar cell:
Edge isolation
Texture
Inductively Coupled Plasma (ICP) source
RF Generator: 13.56 MHz, 1000 W
Standard gas: O2
Gas flow control: Analog type MFC
Dry pump: >150 m³ / hr
Base pressure: >10^-2 Torr
Process pressure: 50~200 m Torr
Automatic system: 15" TFT Panel / IPC / Windows 2000 XP
2010 vintage.
C-SUN PRS is an automated wafer and mask scrubber designed to provide advanced cleaning, highly effective wafer edge contamination removal, and edge bead redesign applications for semiconductor fabrication. PRS is a dual unit device capable of performing two types of operations in parallel, minimizing the total process time and increasing cost efficiency while meeting the highest industry standards for yield and process quality. C-SUN PRS uses a combination of mechanical brushing and wafer edge cleaning technology to provide best-in-class wafer edge contamination removal. A specifically designed wafer edge template helps engineers control the brush length and precisely control the cleanup angle to reduce exposure incidents or accidents. Available in a variety of customizable brushing pressure settings, the equipment can easily adjust brush speed and pressure according to die size and type. The ergonomic and intuitive design allows the operator to perform wafer edge cleaning operations quickly and with greater precision and safety. PRS also includes advanced mask scrubbing technology which allows quick and complete removal of any particulate matter, even the most troublesome residues. The polished wafer surfaces are then passed through a specially designed chemical reactor to remove any residual materials and contaminants. The automatic chemical analysis feature helps the operator quickly identify the most suitable cleaning solution, while the optimized temperature and humidity control ensures optimal wafer performance and yields. C-SUN PRS comes with a range of advanced features designed to maximize throughput and increase convenience, such as the integrated RFID system for tracking the process from machine startup to full unit shutdown. The optional automatic cartridge replacement machine allows for fast and easy switching between wafer edge and mask cleaning operations, allowing the operator to complete their task without manual intervention. Available with a range of fully integrated software tools for wafer cleaning, Edge ReDesign and mask scrubbing, PRS provides an efficient and cost-effective way of maintaining clean and functional wafers before and after fabrication. From simple maintenance users through to advanced edge maintenance users, this automated wafer and mask scrubber is the ideal choice for achieving the highest yield and quality.
There are no reviews yet