Used CHAO QUAN JWT-352-1010-4 #293642080 for sale

CHAO QUAN JWT-352-1010-4 Wafer & Mask Scrubber is an advanced, semiconductor processing technology cleaning equipment used for the removal of microscopic contaminants from both the face of a mask and the surface of a wafer. Its one-step operation provides thorough, uniform scrubbing from the front and rear of the mask as well as from the surface of the wafer. It is designed to provide superior automatic cleaning performance for increased process yield and film uniformity. Its use of specialist scrubbing technology allows for highly efficient removal of microscopic particles, such as those caused by static electricity, without leaving residue on either the mask or the wafer. This ensures the integrity of the film deposited through vacuum evaporation. JWT-352-1010-4 Wafer & Mask Scrubber utilizes an array of advanced, robotic technologies to provide true automation of the cleaning process. A robotic arm moves the wafer/mask using vision guidance technology to precisely position the wafer/mask into the cleaning chamber. To ensure uniform removal of contaminants, an ultrasonic vibration feature is incorporated which operates in tandem with the scrubbing jet system. The jet unit projects specially formulated, abrasive-free scrubs onto the surface of the wafer/mask for the removal of contaminants. Furthermore, CHAO QUAN JWT-352-1010-4 offers a unique, triple cleaning chamber operation that allows simultaneous cleaning of both the wafer and the mask at independent pressures. This feature offers optimization of the cleaning process and allows for an extended operation life-span of the machine. JWT-352-1010-4 Wafer & Mask Scrubber offers an easy to use, operator friendly interface that allows for fast, error-free operation across a comprehensive range of semiconductor process applications. It offers top-notch performance for reliable long term use and is backed by CHAO QUAN advanced service and support infrastructure. This ensures a seamless operation and maximizes process yield and data uniformity.