Used CS ENG CSX-W220 #9358670 for sale

CS ENG CSX-W220 is a state-of-the-art wafer and mask scrubber designed to give optimal cleaning and surface pre-treatment to wafers and masks during semiconductor processing. It is a highly efficient and versatile equipment that can be used on a variety of wafer and mask types, including flat surface, textured, and three dimensional wafers and masks. CSX-W220 is equipped with an ultrasonic cleaner, scrubber brushes, a squeegee, and a dust-removal system, which are all powered by a robust AC servo motor. With these tools, CS ENG CSX-W220 can easily and thoroughly clean and remove dust, debris, and other contaminants from wafers and masks. CSX-W220 features a unique design that allows for the most efficient and consistent cleaning capabilities. Its powerful brush unit, with four sets of 2-inch high-pressure brushes, provides a scrubbing force of 4,000g/min that can remove even the most ingrained particles. The brushes are flexible enough to be able to reach into the tightest of spaces and clean thoroughly. With a maximum speed of 8,000RPM, the brushes are able to move rapidly across the surface, ensuring that all dust and debris are removed in a single pass. In addition to its brush machine, CS ENG CSX-W220 also features an ultrasonic cleaner that helps to loosen and rinse off any stubborn dirt or contaminants. The ultrasonic cleaner has a frequency range of between 20kHz and 100kHz, and a power range of up to 850W, enabling it to quickly and effectively remove particles and contaminants. CSX-W220 also features a powerful squeegee tool that uses synthetic rubber wipers to swipe away large particles from the surface. The squeegee is adjustable to firmly press against the surface, ensuring that it wipes away any large particles in a single pass. It also has a dust removal asset which helps to remove any fine particles or dust that remain after the brush and squeegee systems have been used. The model also has adjustable controls that allow the user to customize the cleaning cycle and intensity, ensuring that a clean and dust-free surface is achieved. All in all, CS ENG CSX-W220 is an efficient and versatile wafer and mask scrubber. With its robust design and powerful cleaning tools, CSX-W220 can quickly and effectively remove even the tiniest of particles from wafers and masks, making it an ideal cleaning and pre-treatment solution for semiconductor processing.