Used DAEJIN DAT-T200 #9380573 for sale

DAEJIN DAT-T200 wafer and mask scrubber is a compact device designed for the cleaning and scrubbing of semiconductor wafers and masks in a semiconductor production environment. The scrubber is composed of two components: a scrubbing tank and a drying tray. The scrubbing tank features a central mixing paddle that rotates at a set speed to consistently mix and rinse the wafers and masks with a detergent-filled solution. The solution tank is temperature-controlled to ensure that the optimal solution temperature is maintained throughout the scrubbing process. Additionally, DAT-T200 can be set to an automatic washing and drying cycle, based on the type of material and desired cleanliness level. The drying tray has two compartments, one for wet and one for dry units. Using hot-air technology, the wet units are dried with filtered air and returned to the dry compartment. This helps eliminate the introduction of airborne contaminants and ensures that uniform drying is achieved. Additionally, the drying tray can be filled with chemicals to improve performance. DAEJIN DAT-T200 is also equipped with an advanced water-saving system to help save water and energy. The scrubber offers excellent reproducibility and uniformity across a wide range of materials and applications. It is also suitable for both wafers and masks with feature sizes of up to 50um. In addition, the compact design of the scrubber allows for easy integration of the device into the existing production environment. From a safety perspective, the scrubber is equipped with an overpressure valve to prevent over pressurization of the tank and protect against possible explosions and fires. In addition, the scrubbing tank lid is designed with a protective emergency stopper for enhanced operator safety. In summary, DAT-T200 scrubber offers a compact and reliable solution for semiconductor production processes. It is built with the latest features and technologies to maintain a consistent and uniform scrubbing, while ensuring safety at all stages of the process. The scrubber is ideal for wafers and masks with feature sizes ranging up to 50um, and is built to provide an efficient, low-cost solution for an increased production capacity.