Used DISCO DCS 140 #9246368 for sale

DISCO DCS 140 is a sophisticated wafer-mask scrubber designed for handling semiconductor processing applications such as photoresist, etching, and CMP. The machine features a broad range of motion and automated scrubbing capabilities, allowing for high-precision cleaning of lithography reticles, exposure masks, gates, and anti-reflection surfaces. DISCO DCS140 is designed to achieve thorough cleaning with minimal material wastage, allowing for optimal cost-efficiency in critical production processes. DCS 140 is constructed with a 3-axis motion control equipment and features an X-Y traversing stage that is driven by a high-precision DC servo motor. This compact system allows for both pattern scrubbing and area-wise cleaning, depending on the application and substrate type. In addition, the machine has a z-axis that is driven by a linear motor, providing a high-speed scanning range of up to 200 µm. These important features enable the scrubber to fulfill a number of complex cleaning tasks with high accuracy. The scrubber has a wafer spin rate of up to 180 rpm, offering quick and thorough cleaning of wafers with minimal contamination. Additionally, DCS140 is equipped with a water-purification unit, which prevents corrosion and pollution. The machine is also capable of providing multiple cleaning paths, allowing cleaning fluid to readily reach even inaccessible areas. Moreover, the machine has a multilingual LCD touch screen, which provides users and operators with simple control over the scrubber. This user-friendly interface has a real-time data monitoring machine, making it easier for operators to assess the cleaning process. The scrubber's software also has data saving and editing capabilities, enabling users to quickly recall and customize cleaning cycles as needed. DISCO DCS 140 is a highly efficient and versatile wafer-mask scrubber, offering consistent and accurate cleaning of a range of materials and substrates. Its high-precision features and user-friendly interface make it the ideal choice for modern semiconductor production processes.