Used DISCO DCS 140 #9277969 for sale

Manufacturer
DISCO
Model
DCS 140
ID: 9277969
Wafer cleaning system.
DISCO DCS 140 is an advanced, high-performance wafer and mask scrubber designed to achieve the highest, cleanest, and most stable planarization performance. This model is designed to deliver accurate, repeatable results while reducing processing time, cost, and risk. DISCO DCS140 features advanced scrubbing technology to thoroughly clean and polish wafers and masks. This model is equipped with an advanced, four-axis control equipment, allowing for precise, uniform scrubbing and minimal wafer-to-wafer variations. Its improved rotary spindle and motor enable precise cleaning, while the spindle-detection function ensures accurate positioning of the spinning scrubber head. To achieve optimal scratches per inch (SPI) control and consistent cleanliness across the entire surface of the substrate, it features an advanced vibratory polishing and scrubbing system. Additionally, the high-pressure water spray unit ensures thorough and effective cleaning of both wafers and masks. The detergent delivery machine is designed to deliver the precise amount of detergent necessary to ensure cleanliness in accordance with the scrubber's optimal settings. Its fine-ring positioning accuracy and short scrubbing cycle time help reduce cycle time. Additionally, this model is customizable to suit the user's specific process, enabling quick and efficient changeovers with minimal operator training. Lastly, DCS 140 is designed to provide a safe and secure operation. It includes an ozone-exhaust gas-cleaning tool to remove ozone and other gases created during cleaning sessions. Its multi-step safety design makes it one of the most reliable scrubbers on the market, while its large, open-access design makes it easy to clean and maintain. Overall, DCS140 scrubber is a highly advanced, high-performance, and reliable unit that helps users achieve the highest-quality planarization performance, while helping them reduce their processing time, cost, and risk.
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