Used DISCO DCS 141 #9232877 for sale

DISCO DCS 141 is a versatile wafer and mask scrubber designed for processing semiconductor wafers and photomasks. Its primary purpose is to remove particulates from the surfaces of both products, ensuring their optimal performance. Utilizing a combination of advanced cleaning technologies, the equipment is capable of achieving high levels of cleanliness across a wide range of materials and applications. The system consists of both a wafer scrubber and a mask scrubber, each of which is optimized for a particular material type and end-use. The wafer scrubber uses a quartzite brush unit, operated by a robotic arm, to scrub off surface particles from wafers in a plastic tank. The scrubbe utilizes ultrasonic cleaning, where ultrasound waves vibrate suspended particles so that they can be removed from the wafer surface. The particles are collected in the plastic tank and are then drained and collected. The mask scrubber uses an ultrasonic nozzle, which sprays a cleaning solvent onto the surface of a mask. It has a variety of spray and vacuum settings depending on the material or application, which ensure that the particles on the mask are removed in the most effective way. The cleaning liquid is collected in a container and disposed of in a safe, environmentally friendly manner. Both scrubber components use DI water as the cleaning liquid to ensure particle removal efficacy. The machine is compatible with a variety of cleaning solvents, including DI water, acetone, and isopropyl alcohol. Its advanced design also allows for a range of process conditions, such as temperature and pressure, to ensure optimal cleaning results. The tool also has a built-in fault detection function; in case of any detected problem in the process, it can report this by sending an alarm, informing technicians of the issue. This ensures that the cleaning process runs smoothly and that there is a permanent record of the results. DISCO DCS141 also has an intuitive user-interface, making its activities straightforward and easy to manage. Overall, the asset is designed to provide long-lasting, efficient cleaning performance for a range of both semiconductor products and photomasks.