Used DISCO DCS 141 #9355561 for sale

DISCO DCS 141
Manufacturer
DISCO
Model
DCS 141
ID: 9355561
Vintage: 2006
Wafer cleaning system 2006 vintage.
DISCO DCS 141 wafer and mask scrubber is a precision cleaning equipment designed for use in advanced semiconductor wafer and mask cleaning applications. The system is designed for cleanrooms and features a self-contained scrubbing module that is compatible with various scrubbing materials, including water, solvent, and ammonia. The scrubbing module is equipped with a temperature-controlled bath and uses four-way pressure-balanced valves to ensure consistent scrubbing action. The scrubbing unit is capable of scrubbing up to 100 wafers or masks in one cycle. The scrubbing process begins with a shower of deionized water to remove dust, dirt, and other surface contaminants from the wafer or mask surface. This is followed by a presoak with an aqueous solution to further clean the wafer or mask surface. The third step of the process is the actual scrubbing, which is done using various scrubbing agents, specifically selected according to the wafer or mask material. The scrubbing process is completed with an after-rinse cycle to ensure that any remaining scrubbing agent is thoroughly flushed away. Other features of the machine include an adjustable-speed conveyor belt to move the wafers or masks through the scrubbing process, as well as a PC-based graphical user interface (GUI) for easy monitoring and control of the tool. The asset also includes a number of safety features designed to ensure worker safety during operation. These safety features include a safety interlock preventing scrubbing operation when the lid is open, and pressure relief valves to prevent excessive pressure buildup in the scrubbing chamber. DISCO DCS141 is designed for use in high-volume production environments and is ideal for wafer and mask cleaning applications that require accurate and repeatable results. The model's combination of high-precision technology and robust safety measures makes it a reliable and efficient cleaning solution that can help maintain the highest level of wafer or mask quality.
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