Used DMS M600 #9316329 for sale

DMS M600
Manufacturer
DMS
Model
M600
ID: 9316329
Wafer Size: 12"
Foup cleaner, 12" Mainframe.
DMS M600 is a wafer and mask scrubber system that utilizes advanced cleaning and washing technologies to remove contamination from the surfaces of semiconductor products. The scrubber comprises a series of scrubbing and rinsing stages which can be tailored to a customers specific needs. It is designed to remove process residues, contaminates and debris from the surface of a variety of types of semiconductor products such as bare silicon wafers, masks, steppers, metrology tools and more. DMS M 600 incorporates an intelligent scrubbing head to optimize the scrubbing process for different materials and applications. The head is mounted to a servo motor and is able to move up and down as well as side to side. This allows the scrubbing head to evenly disperse the appropriate scrubbing media during the cleaning process. The scrubbing head has adjustable pressure settings, which can be set according to the material being cleaned. The scrubbing media used in M600 is low foaming, non-abrasive, and non-hazardous. It is specifically formulated to remove particles, contaminants and filtration residue from hard-to-reach surfaces and can be recycled in order to improve efficiency and reduce cost. The scrubber also includes an adjustable water management system to ensure the optimal volume of water is used during the rinse process and to further reduce costs. M 600 also includes a drying process which includes a nitrogen system to effectively remove all moisture from the surfaces after the cleaning and washing process has been completed. The scrubber is built for industrial use and has a robust construction for maximum durability. DMS M600 is capable of scrubbing up to 100 flat surfaces and is designed for use in a cleanroom environment. DMS M 600 is a highly efficient and cost-effective way to remove contamination from various types of semiconductor products. It features simple operation and quick cleaning and drying times, making it an ideal choice for many semiconductor production facilities.
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