Used DMS PDCLN #293608705 for sale
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DMS PDCLN is a high performance wafer and mask scrubber developed by Disruptive Materials Solutions (DMS). This device is designed to remove unwanted particles without causing damage to the wafer substrates. It utilizes a cleaning system composed of two unique components - the scrub head and the cleaning solution. The scrub head consists of a precision-engineered structure with variable jet holes, a stationary jet head, and a variable jet head. This allows it to accurately target particles as small as 0.1m (0.004 required for mask cleaning). The jets are powered by a high-powered air flow, which helps to dislodge particles from the substrate surface. Additionally, this system is equipped with an automatic adjustment feature which allows for the adjustment of the scrubbing force, thus assisting in achieving an optimal cleaning effect. The cleaning solution utilized in PDCLN is specially formulated to ensure efficient and effective particle removal. The pH-balanced liquid contains surfactants, emulsifiers and detergents, all of which are designed to reduce surface tension and dissolve impurities without causing damage to the wafers. Furthermore, this solution is compatible with a variety of substrates, including non-porous as well as porous materials. In addition to its advanced cleaning technology, DMS PDCLN also comes with a comprehensive maintenance protocol which includes regular scheduled maintenance, user-defined maintenance and error detection diagnostics. The maintenance is designed to reduce downtime, enhance performance, increase the life of the machine and reduce energy consumption. Overall, PDCLN is an advanced wafer and mask scrubber that has been designed for maximum efficiency. Its precision engineering ensures the accurate removal of debris, its automated adjustment feature assists in achieving a superior cleaning result, and its comprehensive maintenance protocol ensures optimal performance. As a result, it is an excellent choice for organizations looking for a reliable wafer and mask cleaner.
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