Used DNS / DAINIPPON HMS-TVM-300 #9159859 for sale

DNS / DAINIPPON HMS-TVM-300 is an advanced wafer and mask scrubber designed for use in the semiconductor industry. The scrubber is capable of handling substrates, masks and wafers up to 500mm in size and features an advanced programmable controller to provide precise control over the scrubbing process. The scrubber offers several features that make it well-suited for semiconductor processes. The scrubber has a flatwork platform that can support up to 300mm wafers. The flatwork has a special coating to protect against scratching and abrasion. The scrubber also has a high flow rate of up to 200 LPH and a low running pressure of 50kPa. In addition to scrubbing, DNS HMS-TVM-300 also has a dry etching process compatible with sulfuric acid, nitric acid, hydrofluoric acid and other standard semiconductor etchants. The scrubber is also equipped with photoresist platforms to process photoresist materials and spinners that can support up to 8 wafers of up to 100mm in size. For safety, the scrubber has several safety features including an operator-protected enclosure, automatic shut-off and warning systems, and an energy-absorbent spring-loaded platform. The scrubber is also compatible with standard safety protocols, including static dissipation and proper operation of other system components. DAINIPPON HMS-TVM-300 is designed with a compact footprint, making it suitable for installation in a variety of working environments. The scrubber is also designed to be easily integrated into existing semiconductor production lines and can interface with other systems such as material transfer systems and CMP polishing systems. The scrubber offers high throughput and low maintenance costs, making it a cost-effective solution for many semiconductor processes. The advanced programmable controller offers precise control over the scrubbing process, allowing for high quality scrubbing results on a consistent basis. The scrubber is also highly adaptable and can be used to process a variety of materials and substrates.