Used DNS / DAINIPPON SS-3000-A #9184975 for sale
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ID: 9184975
Wafer Size: 12"
Vintage: 2007
Front scrubbers, 12"
(3) FOUP
Spin chuck vacuum type
DI Rinse nozzle
(2) Back rinse nozzles
Nano spray:
N2 MFC
E-Flow
2007 vintage.
DNS / DAINIPPON SS-3000-A is a state-of-the-art wafer and mask scrubber equipment designed to provide superior cleaning results for a variety of industrial-level semiconductor production needs. It is designed to handle wafer diameters ranging from 4-8", in a single pass, through its proprietary Clean-Flow™ scrubber system. The Clean-Flow™ unit uses a unique combination of multiple high-speed brushes, multiple settling tanks, and multiple wash cycles to effectively clean wafers and masks. The machine can be customized to meet the specific needs of each application, allowing for personalized set-up for optimal cleaning results. DNS SS-3000-A is designed to run up to eight different scrubbing heads at once, allowing for maximum scrubbing power and unrelenting scrubbing pressure. The scrubbing heads are able to rotate at speeds of up to 12,000 RPM, ensuring maximum accuracy and thorough scrubbing of intricate features. The brushes are fixed in the scrubbing head, allowing them to reach hard-to-reach locations without skipping over features on the wafer or mask. The Clean-Flow™ scrubbing tool is also equipped with four mechanized arms, each with independent, variable speed, allowing for extreme accuracy and excellent deftness, especially when dealing with intricate features on the wafer or mask. The asset also includes a state-of-the-art drying unit, meant to provide optimum drying of the scrubbed wafer and mask. The drying unit includes two separate fans, capable of drying up to an incredible 660 liters of air per minute. It also be can be programmed for customized drying cycles for the wafers or masks, allowing the user to customize the drying process to the exact needs of their particular project. Additionally, DAINIPPON SS-3000-A features a unique Pro-Clean™ model, designed to reduce the build-up of dust and particles, ensuring precise cleaning regardless of the environment. Overall, SS-3000-A provides superior cleaning results for a variety of industrial-level semiconductor production needs. It offers customizable scrubbing speed, pressure, and drying cycles, making it highly versatile and perfect for any project. With its excellent accuracy, efficiency and ease of use, DNS / DAINIPPON SS-3000-A is a great choice for high quality and thoroughly cleaned wafers and masks.
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