Used DNS / DAINIPPON SS-3000-AR #9388189 for sale

ID: 9388189
Wafer Size: 12"
Vintage: 2007
Wafer scrubber, 12" 2007 vintage.
DNS / DAINIPPON SS-3000-AR is a state-of-the-art wafer and mask scrubber designed to meet the exacting standards of cleanroom environments and chip fabs. It offers superior safety and performance features, allowing users to maintain cleanroom standards while reducing the time, cost, and effort associated with mask and wafer cleaning. The wafer and mask scrubber features an all-encompassing BPHE (Brazed Plate Heat Exchanger) with a stainless steel construction that prevents contamination and can efficiently and effectively maintain pre-set temperatures of up to 250°C (450°F). The BPHE also maintains uniform temperature throughout all wafers and masks. The scrubber is equipped with an adjustable automated washing system to ensure optimum cleaning efficiency. It features adjustable nozzles that can be set to a specific pressure and frequency that can be tailored to meet the individual needs of the user. The automated washing system also maintains the same concentration of solvents throughout the cycle, making sure that all parts are cleaned consistently and uniformly. The highly advanced scrubber also features an automatic scrubbing mechanism that is specifically designed to eliminate the risk of contact contamination. It uses an automated brush-activated system to ensure full coverage of all surfaces and is capable of quickly and thoroughly scrubbing off all dirt, oils, oxides, and other contaminants. DNS SS-3000-AR is constructed with a robust frame that helps ensure the stability of the device while allowing for full access to all parts for maintenance or adjustments. It is compliant with industry-wide safety and performance regulations, such as ISO 14644-1 and CSA standards, ensuring that the product maintains the highest level of functionality and reliability. DAINIPPON SS 3000 AR is a great choice for anyone who needs a reliable and efficient wafer and mask scrubber that can deliver consistent results while keeping within cleanroom standards and regulations. Its superior features and construction make it an ideal choice for semiconductor, MEMS, and photomask applications.
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