Used DNS / DAINIPPON SS-3000 #9176376 for sale

DNS / DAINIPPON SS-3000 Wafer and Mask Scrubber is a sophisticated equipment used in the fabrication process of semiconductor devices. It is designed to effectively remove the residuary particles on wafer and mask surfaces, enabling the process to minimize yield loss and provide a clean manufacturing environment. The equipment is composed of a scrubbing station with a single brush scrub mask and wafer mechanism, a double-head scrub brush, and a PLC controller. The scrubbing station utilizes an NC spindle with a built-in air floatation device, allowing the scrubbing brush to be precisely positioned in relation to the wafer or mask to be scrubbed. The double-head scrub brush is designed to provide maximum scrubbing power, and is fitted with an air bearing device for smooth, accurate and fast scrubbing movement of the brush. DNS SS3000 system is also equipped with a SIP-7000 type sieve to prevent debris from re-entering the scrubbing process. The sieve is capable of efficiently screening and separating particles of 0.1 to 5.0 microns in size from the scrubbed solution. Additionally, an open unit format is provided, allowing for customization and integration with other systems. The PLC controller is the heart of the machine, allowing for operation in full automated mode. The automation can be programmed to select the speed and direction of the scrubbing brush based on the size of the wafer and/or mask, as well as the degree of contamination on the surface. DAINIPPON SS 3000 is designed for maximum performance, efficiency, and ease of use. It is capable of providing a quality clean-up of the wafer or mask surface, even after long term use. Furthermore, the tool is designed to be easily maintained, and the user can easily replace worn or defective parts. In conclusion, SS 3000 Wafer and Mask Scrubber is a sophisticated cleaning and scrubbing asset that is designed for maximum performance, efficiency, and ease of use. With the built-in PLC controller, the model can be operated in a fully automated mode, and the double-head scrub brush can effectively remove any contamination from the wafer or mask. Additionally, the SIP-7000 type sieve and easy maintenance design contribute to maximizing the overall effectiveness of the equipment.