Used DNS / DAINIPPON SS-3100 #293810127 for sale

ID: 293810127
Wafer Size: 12"
Vintage: 2012
Wafer scrubber, 12" Power box (4) Load ports Wafer type: Notch Main controller Host controller Indexer Transfer robot Reverse unit (4) SSM Spin units (4) SSV Spin units (4) SHINKO SELOP Load ports CO2 Bubbler maker Remote AC Box Handler system: (4) SS Chucks (4) SSR Chucks Indexer robot Transfer robot Reverser Process chambers: SC1 CO2 Water Rinse / Spin dryer Process: Brush DI Water filter (3) Nozzles: Spray, rinse, back rinse SSV: Vacuum chuck (5) Nozzles: Back side rinse, SC1, Spray1, Brush1, Brush2 SSM: Magnetic chuck (4) Nozzles: Back side rinse, SC1, Spray1, Brush1 Power supply: 208 V, 60 Hz 2012 vintage.
DNS / DAINIPPON SS-3100 Wafer & Mask Scrubber is a revolutionary new scrubbing tool, designed for advanced-level optics and semiconductor packaging. This state-of-the-art scrubber features a unique combination of advanced cleaning, high energy focusing, and supercritical fluid dispersion techniques that enable thorough and effective cleansing of sensitive optical components, as well as integrated circuits. DNS SS-3100 scrubber utilizes a special three-mode controlled vacuum to effectively eliminate dust, particles and surface imperfections on any type of substrate or mask wafer. The scrubber's vacuum is designed to easily adjust to different sizes and shapes of substrates and create an optimal scrubbing environment. Additionally, the scubber is capable of effectively removing all types of contaminants, including oil, solder and other industrial residue, to give you the cleanest results. With DAINIPPON SS 3100 scrubber, users can easily clean sensitive masks and wafers, such as silicon and TFTs, for enhanced quality control in the semiconductor industry. DNS SS 3100 scrubber is equipped with a high energy focusing system to ensure maximum effectiveness during the cleaning process. This system effectively reduces fluorine and sulfate contamination levels for improved semi-conductor surface smoothness and decreases contamination from polymers and adhesives. Additionally, it effectively controls the layer thinning process for accurate cleaning of thin layers. Thanks to its supercritical fluid dispersion technology, SS 3100 scrubber is capable of removing unwanted contaminants with high supersonic jet velocity. By creating an air/liquid-gas mix, the scrubber produces an extremely concentrated cleaning solution that is capable of effectively tackling a wide variety of surface problems. With this technology, the scrubber is able to not only clean the surfaces of substrates and masks, but also examine them with high accuracy. Overall, DNS / DAINIPPON SS 3100 is an exceptional wafer and mask cleaning device that offers advanced cleaning functions and critical fluid dispersion. This scrubber is ideal for use in the semiconductor industry and ensures maximum efficiency in the cleaning process. Furthermore, it is also able to closely examine the results of the surface cleaning, making it a great choice for high-performance, quality-conscious companies.
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