Used DNS / DAINIPPON SS-80BW-AR #9205458 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9205458
Scrubber, 8"
SMIF Type
Options: 2F / 2B
Moving type: Transfer robot
Loading position type: Right-side type
Signal tower: 4-Color (GYWR) Patlite type
Indexer unit:
(4) SMIF Type
Wafer detect sensor
Transfer robot (Vacuum less) / X,Y, Z, R Axis
TR Unit:
Dual arm transfer robot (Vacuum less) / XI, X2, Y, Z, R Axis
Wafer detect sensor
Back-side spin unit:
Magnetic chuck type
Brush nozzle (Normal type)
Jet nozzle
DIW1, D1W2, back rinse, brush rinse, N2 blow, N2 purge
Front-side unit:
Vacuum chuck (Black acetal)
Brush (Brush pressure control system)
Jet nozzle
DIW1, DIW2, Back rinse, brush rinse, N2 blow, N2 purge
Reverse unit: (2) Reverse units
Side cabinet:
(4) High pressure pumps / EBARA / PJ-50 / E50-R13K / 5(Mpa)
Meg-con system
FFU Chamber & controller
Drain mani-fold unit
2000 vintage.
DNS / DAINIPPON SS-80BW-AR is a wafer and mask scrubber designed specifically for lithography production. The scrubber offers a high level of automation and control enabling reliable cleaning without harm to the wafer or mask. The equipment is suitable for a range of applications including cleaning masks prior to lens and exposure systems, as well as scrubbing of wafers after developing. DNS SS-80BW-AR scrubber offers a reliable and efficient cleaning process, with features such as a high-precision controller, adaptive scrubbing force, and a hinged lid for easy access. The scrubber uses a computer-controlled force to provide gentle scrubbing of masks and wafers. The force can be adjusted between 0.8-2.4N to ensure that the cleaning is optimally suited to the sensitivity of the material being scrubbed. The scrubber has two main sections: a cleaning chamber equipped with a scrubbing wheel and cleaning fluid, and a control chamber. The cleaning chamber is designed to decrease carryover of cleaning fluid from previous wafers. The control chamber houses a vacuum source, temperature sensor, force sensor, pressure sensor, as well as a CCD camera for real-time monitoring of the cleaning process. The system is designed for low particle and water contamination, and includes a unit for controlling the temperature of the scrubbing tool. The scrubber also features an RR monitor function, which allows users to monitor particle size, concentration, and flow rate. To ensure safe and reliable operation, DAINIPPON SS 80BW AR scrubber is designed to alert the user of any potential contamination or errors during the scrubbing process. The machine is also designed to prevent cross contamination between wafers by automatically cleaning the scrubbing wheel after every use. SS-80BW-AR is an ideal choice for wafer and mask cleaning in lithography production. It provides a reliable, automated cleaning process with adjustable scrubbing force, temperature control, and particle control. The scrubber is easy to use and maintain, reducing downtime and increasing productivity.
There are no reviews yet