Used DNS / DAINIPPON SS-W60A-A #9290535 for sale

DNS / DAINIPPON SS-W60A-A is a wafer & mask scrubber developed by DNS Screen Manufacturing Co. Ltd. This scrubber is specifically designed to clean the surfaces of wafers and masks used in semiconductor production process. This modern scrubber is equipped with the latest techniques and innovative functions that provide an effective solution for wafer and mask cleaning requirements. DNS SS-W60A-A is composed of a 3-axis motion system and a two-dimensional (XY) table. This allows the scrubbing unit to move in three directions simultaneously; up and down, forward and back, and left to right. The scrubber is also equipped with brushless motors and transmission systems to provide precise and established motion stitching to ensure accurate and repeatable results. The scrubber's base is made from heavy-duty materials, ensuring an overall stable operation. In addition to the motion system, DAINIPPON SSW-60A-A also features a double-seal suction cleaning unit. This unit works by first raising and lowering a stainless-steel scraper to remove debris from the wafer or mask surface. A suction pump then draws in any remaining debris, while a strip washer scrubs the surface, removing dust and other particles. The scrubber's cleaning unit is capable of adjusting the cleaning force to accommodate different wafer and mask sizes without damaging them. This scrubber also has an automatic self-clean mode, allowing the user to perform maintenance while the machine is running. This feature provides an increased level of safety and convenience, and helps reduce the cost and time for maintenance. Finally, DAINIPPON SS-W60A-A is equipped with sensors and alarms. These sensors are designed to detect any issues or abnormalities that may occur during the cleaning process, and the alarms can alert the user to any problems. Overall, DNS / DAINIPPON SSW-60A-A is an innovative and effective scrubber for cleaning wafers and masks used in semiconductor production processes. It features a 3-axis motion system and two-dimensional table, double-seal suction cleaning unit, automatic self-clean mode, and sensors and alarms. These features provide an efficient and safe cleaning solution for both wafers and masks.