Used DNS / DAINIPPON SS-W80A-A #9389933 for sale

DNS / DAINIPPON SS-W80A-A
ID: 9389933
Scrubber.
DNS / DAINIPPON SS-W80A-A is a wafer and mask scrubber, which is used to clean photo resists from wafer surfaces and masks. The scrubber is equipped with a patented film-removal system to ensure superior process results. The scrubber is designed to reduce particle contamination on the wafer and mask surfaces, which can improve device yields. It is compatible with various Photo resists and masks, including dry film, chemical-based, and hot-cure resist systems. The scrubber uses a water-circulation system with temperature control and flow control to ensure a consistent cleaning process. The scrubber is also equipped with a powerful motor, allowing for a clean process without leaving any residual particles on the substrate. The scrubber has a unique mix of features, including digital temperature control, a dual-showerhead design, and various water and suction pressure settings. The temperature control feature ensures that the temperature of the liquid and air used in the cleaning process is consistent, thus preventing thermal damage to the wafer and mask. The dual-showerhead design allows for greater cleaning efficiency and flexibility. The various water and suction pressure settings can be adjusted to suit different cleaning requirements. The scrubber has a built-in vacuum system, which helps in the removal of non-conductive particles from the wafer and mask surfaces. The scrubber is also equipped with a high-tech filter for collecting particles in the wash water. This helps to reduce particle buildup in the wash tank, making the whole cleaning process easier and more efficient. The scrubber is also equipped with an LCD panel that allows for easy operation and monitoring. The LCD panel displays all the necessary information about the cleaning process, such as temperatures and pressure settings, as well as real-time monitoring. DNS SSW 80A A is a highly advanced wafer and mask scrubber, which can be used to improve yields and reduce contaminants on wafer and mask surfaces. Its advanced features provide the user with superior process control and monitoring, allowing for clean and reliable results every time.
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