Used DNS / DAINIPPON SS-W80A-AR #293610243 for sale

DNS / DAINIPPON SS-W80A-AR is a wafer and mask scrubber designed to meet the rigorous requirements of semiconductor manufacturing. This machine is capable of handling wafers and masks up to 8-inch in size, with a maximum distance between wafers of 0.7 inches. DNS SSW80A-AR consists of two main components, the main body and scrubber mechanism. The main body is a highly durable plastic frame and is designed to be extremely stable when in use. This main body houses a lithography aiming lamp and a light-diffusion device, providing stable and uniform light distribution between the wafer and mask surfaces. The scrubber mechanism is composed of a horizontal precision ceramic head, surrounded by a scrubbing rubber belt, which rotates at a constant speed of up to 2000 RPM. The scrubber also features a brush-clutch mechanism that allows quick and easy replacement of the brush belts. DAINIPPON SSW-80A-AR provides a wide variety of cleaning operations, such as single-point cleaning, corner cleaning, full-surface cleaning, buffing and polishing. The scrubber is capable of cleaning two 8-inch wafers and one mask at the same time, allowing for quick and efficient cleaning of multiple wafers or masks. In order to ensure high-accuracy and safe operation, the scrubber features a Z-axis offset control equipment and an X-axis movement control system. The Z-axis offset control unit allows for precise adjustment of the scrubber's position, while the X-axis movement control machine controls the scrubber's path of travel. DNS / DAINIPPON SSW-80A-AR is an ideal solution for semiconductor manufacturers, as it provides an efficient and cost-effective means of cleaning wafers and masks. The machine is also capable of offering several cleaning options, ranging from single-point cleaning to full-surface cleaning and buffing. Additionally, the adjustable head and brush mechanism allows for easy replacement of brush belts. All in all, DNS SS-W80A-AR makes for an ideal choice for those who need to clean multiple wafers and masks with total accuracy and precision.