Used DNS / DAINIPPON SS-W80A-AVR #9095607 for sale

DNS / DAINIPPON SS-W80A-AVR Wafer & Mask Scrubber is an advanced equipment for cleaning commercial wafers and masks used in semiconductor manufacturing. It utilizes a vibratory equipment to clean the wafer and a spray nozzle to remove contaminants from the mask. The AVR model is a well-constructed unit that is both efficient and effective for scrubbing and cleaning. The unit features a horizontal oscillation system for cleaning wafers, offering flexibility in the oscillation frequency and amplitude. It also has an integrated optical sensor that accurately detects when wafers and masks are placed in the cleaning area, making sure that the cleaning process is safely accomplished. The scrubbing performance is further enhanced by dual-level scrubbing, utilizing different nozzles to directly target surface particles. The AVR model also allows for easy and quick loading and unloading. The tray-loading unit is designed so that the wafer and mask are automatically fed into the scrubbed chamber for cleaning, and then automatically unloaded afterwards. An easy-to-use touch panel display makes operating the machine easy. The machine can also be connected to a computer, allowing for communication and remote control of the unit. DNS SS-W80A-AVR Wafer & Mask Scrubber is equipped with an advanced dry cleaning feature. Ozone, active oxygen, and dry air are utilized to provide a thorough and complete cleaning. The air exhaust created by this feature is emitted from the back of the unit, providing a cleaner working environment. The scrubbing process of the AVR model is powered by an open-loop vector controlled drive. This advanced drive tool allows for precision performance and smooth operation of the unit. Additionally, the exhaust asset features an automated blowback exhaust model that helps limit the frequency of maintenance. Overall, DAINIPPON SSW-80A-AVR Wafer & Mask Scrubber is a powerful and efficient unit specially designed for scrubbing and cleaning commercial wafers and masks used in semiconductor manufacturing. Its robust construction, coupled with advanced features, ensures that the cleaning process will run consistently and smoothly.