Used DNS / DAINIPPON SS-W80A-AVR #9235502 for sale

DNS / DAINIPPON SS-W80A-AVR is a wafer and mask scrubber designed for semiconductor production. It is used to remove surface contaminants from wafers and photomasks prior to processing. The scrubber is designed to clean the surfaces using a combination of compressed air and ultrasonic emission, as well as spray and brushes. The device has an overall width of 48.78 inches, a depth of 59.2 inches and a height of 44.48 inches. It is equipped with a large, transparent safety cover and footprint of only 4.7sq ft. This wafer and mask scrubber has two main cleaning components: a wet cleaning station, and a dry cleaning station. The wet cleaning station features three nozzles that emit a high-pressure stream of cleaning liquid, as well as one sono-brush to clean the surface of both the mask and the wafer. The scrubber uses a combination of air and liquid to break up and remove surface contaminants. The wet station also includes a filtered recirculation pump for efficient recycling of the cleaning liquid. The dry cleaning station is a back-pressure, forced air system which uses a stream of air to blow away any remaining surface contaminants, along with a rotating brush for superfinishing of surfaces. The brushstrokes can be adjusted in both the horizontal and vertical directions, allowing for a more precise cleaning result. DNS SS-W80A-AVR also features several safety features to protect personnel and equipment, such as an emergency stop button, a hinged safety door, and an integral particle catcher guard. Furthermore, the scrubber is equipped with a control panel with tactile membrane switches and a four-digit, seven-segment LED display, which provides process monitoring and real-time report generation. Overall, DAINIPPON SSW-80A-AVR is a reliable and innovative wafer and mask scrubber designed to safely and efficiently clean wafers and masks prior to processing. With its combination of wet and dry cleaning, as well as its safety features and control panel, the scrubber is an ideal choice for semiconductor production.