Used DNS / DAINIPPON SSW-60A-AR #293689357 for sale

ID: 293689357
Wafer Size: 6"
Spin scrubber, 6" Non-SMIF Type Loading position type: Left side No GEM Controller 3-Colors signal tower (2) Reverse units Indexer unit: Type: (4) Cassette Wafer defect sensor and vaccumless A type Transfer robot TR Unit: Dual arm transfer robot Wafer defect sensor Back-side spin unit: Mechanical chuck Brush nozzle DIW1, DIW2, Back rinse, Brush rinse, N2 Blow and N2 Purge Front-side unit: Vacuum chuck Brush nozzle Jet nozzle DIW1, DIW2, Back rinse, Jet rinse, N2 Blow and N2 Purge Side cabinet: Jet pump Meghcon cabinet R/D Rack Missing parts: Servo AMO 5-Axis drive T/R Board 2000 vintage.
DNS / DAINIPPON SSW-60A-AR is a wafer and mask scrubber designed to meet the cleaning requirements of the semiconductor industry. The scrubber utilizes a wide variety of cleaning nozzles and brushes to efficiently clean and maintain wafer and mask surfaces. The scrubber is equipped with a 135-degree degree adjustable head. The adjustable head allows for precision cleaning and angle control of the wafer surface, which is essential in application of chemical scrubbing agents. Additionally, the scrubber is equipped with a fully automated cleaning system that automates the scrubbing and drying process. The scrubber is powered by a high-efficiency brushless DC motor that provides strong and stable cleaning performance. The scrubber has an all-metal construction, which ensures exceptional durability and reliability in production applications. Additionally, the scrubber is equipped with a wide variety of cleaning nozzle types for a variety of wafer and mask cleaning applications. The scrubber is capable of scrubbing in ultra-fine cleaning modes, including the CPU (chemical treatment), ED (elastic deformation) and PR-L (primer-reduction) methods. Additionally, the scrubber has a wide range of cleaning speeds ranging from 0.1 to 10,000 revolutions per minute. These speeds provide fine, consistent control over the scrubbing process. The scrubber creates a significantly reduced particle environment, as it is designed with an anti-clogging feature that eliminates particles generated while cleaning. This eliminates the need for achiving elaborate particle collecting equipment in the cleanroom. Lastly, DNS SSW60A-AR is compatible with a number of different types of wafer sizes, including 200mm and 300mm. This ensures that the scrubber can be used in various production applications. In conclusion, DAINIPPON SS-W60A-AR is a highly versatile and reliable wafer and mask scrubber. The scrubber provides for precise cleaning of wafer and mask surfaces, has high-efficiency brushless DC motor, and is compatible with a variety of wafer sizes. Additionally, the scrubber is designed to create particle-free cleaning environment, making it ideal for cleanroom production applications.
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