Used DNS / DAINIPPON SSW-629-B #293608924 for sale
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DNS / DAINIPPON SSW-629-B Wafer & Mask Scrubber is an automated solution for the removal of particles from semiconductor substrates and lithography optics. This device is designed for particle cleaning applications, such as low-k or Cu substrates, for both back-side and front-side sputtering processes. The equipment consists of a cassette loader/unloader, a mainframe containing an MFC controller and machine components, and a series of scrubbing brushes. Each scrubbing brush is composed of a custom-fabricated revolving spindle, which is attached to a motorized, programmable drive. The scrubbing process is operated by a servo-controlled air bearing system, which enables the brush to move synchronously with the rotating spindle, without any friction between the two components. The servo-controlled unit ensures uniform scrubbing pressure across the wafer surface and can be finely adjusted in order to achieve the desired results. The scrubbing process is driven by a microprocessor-controlled program, which allows the brush and spindle speeds to be precisely adjusted. This enables operators to perform highly targeted scrubbing processes with maximum efficiency, ensuring uniform removal of particles across the wafer. The scrubber is also equipped with a 30-watt laser equipped with both auto-focus and power adjustment functions. This allows for highly precise adjustments to be made for optimal cleaning performance. DNS SSW-629B is designed with a cabin-style enclosure to maximize operator safety, as well as to reduce airborne contamination. The interior of the scrubber contains a powerful fume extraction machine that delivers fresh air from outside of the scrubber, preventing air from being recirculated and reducing any exposure to hazardous particles. The scrubber also includes a control unit that allows for convenient control of the device. This includes the ability to program the scrubber settings with operation logs, adjust the scrubber's speed and direction, and monitor the scrubbing process at any time. The control unit also features an intuitive LCD display, making it easy to monitor the scrubber's status and to make any necessary adjustments. DAINIPPON SSW 629B is an advanced wafer & mask scrubber that is designed to reduce the risks associated with particle contamination and to maximize the efficiency of scrubbing processes. Combined with its state-of-the-art features such as its servo-controlled air bearing tool and powerful, adjustable laser, the scrubber provides an efficient, reliable and safe solution for the removal of particles from semiconductor substrates and lithography optics.
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