Used DNS / DAINIPPON SSW-629-B #293808883 for sale

DNS / DAINIPPON SSW-629-B is a powerful and versatile semi-automated wafer and mask scrubber that is specifically designed for scrubbing and cleaning of silicon-based masks and wafers used in silicon device production. This scrubber is equipped with advanced control systems and mechanisms, enabling operators to precisely scrub and clean their wafers and masks with ease. DNS SSW-629B utilizes a Multi-Vacuum-Control (MVC) equipment for efficient scrubbing of both wafers and masks. This MVC system consists of two main components―a vacuum-driven scrubbing head and a suction-cleaning unit. The vacuum-controlled scrubbing head uses compressed air to continuously drive and scrub wafers and masks. The suction-cleaning unit uses suction to effectively remove foreign particles from the surface of the wafer and mask. DAINIPPON SSW 629B is equipped with a tightly sealed spray-type emulsion cleaner, which provides a highly controlled and even distribution of an emulsion cleaner over the surface of the wafer and mask. This emulsion cleaner helps to dissolve and remove stubborn particles, dust and stains. The spray-type emulsion cleaner also helps to decrease defects caused by drags. DAINIPPON SSW 629-B also features an ultra-precise mask/wafer pressure sensor and CCD auto-alignment unit. This pressure sensor is designed to ensure accuracy, speed and top-notch performance when scrubbing wafers and masks. The auto-alignment machine further ensures that the tool is always operated accurately and securely. DAINIPPON SS-W629-B offers various optional modes, such as ULTRASONIC, AUTOMATIC and MICROCLICK, to satisfy a wide variety of applications including wafer- and mask-leveling and micro-patterning. This asset also provides various reports and logs that allow operators to track and monitor the progress of each scrubbing process. Overall, DAINIPPON SSW-629B is an advanced and reliable semi-automated scrubber that is equipped with a variety of features, making it suitable for use in high-volume wafer and mask production environments. Its Multi-Vacuum-Control model, tight seal spray-type emulsion cleaner and accuracy-enhancing features make this scrubber an ideal choice for scrubbing and cleaning silicon-based wafers and masks.