Used DNS / DAINIPPON SSW-80A #9293516 for sale

DNS / DAINIPPON SSW-80A is a wafer and mask scrubber designed to provide an effective cleaning process for semiconductor wafers and photomasks, helping maintain contamination control in cleanroom environments. This scrubber's innovative mechanics provide an effective cleaning process with minimal damage to the components. Its constant speed control allows for uniform wafer and mask pressing and rotating, reducing the risk of scratching and other types of damage. The controlled washing liquid flow ensures a smooth scrubbing process, cleaning effectively while keeping damage and wear to a minimum. For optimal performance and safety, the cleaning cabinet features a stainless steel inner chamber and double-glazed tempered glass soft-close sliding doors. An adjustable staircase facilitates the loading and unloading of wafers, and an efficient cooling equipment helps keep components at a low temperature and protect them from damage. The scrubber also offers a number of load-sensitive features, such as automatic pressure compensation and a micro-dust prevention filter, as well as an optional system monitor for active process monitoring and control. A unique air knife unit avoids cross-contamination by blowing off residual droplets from the cleaned component surface. In addition, the scrubber features an automatic drying machine equipped with infrared and hot air lamps, removing the need to manually dry processed components. The user interface of the scrubber provides intuitive and easy-to-use controls, allowing a single operator to manage the entire process from start to finish. This includes various settings such as pressure speed, liquid distribution range, cleaning temperature, and other parameters. DNS SSW-80A is an innovative wafer and mask scrubber solution that offers an efficient and effective cleaning process, while ensuring accuracy, safety, and quality in cleanroom environments. With its advanced features and intuitive user interface, the scrubber is an invaluable tool in achieving optimal cleaning performance and enhanced contamination control.