Used DNS / DAINIPPON YFT-1030 #9159920 for sale
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DNS / DAINIPPON YFT-1030 is a wafer and mask scrubber that is used to clean semiconductor material substrates before and after device fabrication processes. It is designed to be used with a variety of wafers, from 2" to 12" substrates, and wafers with different thicknesses and materials ranging from nitride-oxide-polysilicon (NOP) to complex structures of alternating substrates (CAS). DNS YFT-1030 uses bristled brushes that are made up of a variety of materials to offer efficient and effective cleaning. The brushes are able to target specific areas to provide more precise cleaning. Additionally, the scrubber is equipped with an automatic lubrication system with user adjustable settings to ensure the brushes remain clean and lubricated for maximum cleaning. This helps reduce the frequency of manual operation, ultimately improving the efficiency of production processes. The brush head of DAINIPPON YFT-1030 is designed to carry a low level of end force. This helps to reduce scratching of the substrate while it is being cleaned. Additionally, YFT-1030 has three levels of cleaning cycles that can be adjusted within seconds. This helps to optimize the cleaning cycle to the substrate type, achieving the best type of cleaning performance while safeguarding the device from damage. DNS / DAINIPPON YFT-1030 has an integrated design that is cGMP compliant, as well as FOUP and FOS and ESD designs. This allows for enhanced product safety and compliance with industry standards. Additionally, it has a footprint of 1500mm x 800mm, making it one of the most compact wafer and mask scrubbers available in the market today. DNS YFT-1030 is also equipped with an advanced touch panel monitor. This is used to control various settings such as the cycle temperature, cycle time, and execution of programs. It also provides real-time feedback on the scrubbing progress and the number of cycles that have been completed. DAINIPPON YFT-1030 is an advanced and efficient wafer and mask scrubber. It combines high levels of cleaning performance with enhanced safety features and real-time monitoring. It is an ideal choice for processing various wafer substrates. It is designed to be reliable and efficient for long-term usage, reducing both maintenance needs and cost.
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