Used E-SUN ES-CLV06 #9244959 for sale

E-SUN ES-CLV06 wafer & mask scrubber is an efficient and reliable cleaning solution for semiconductor manufacturing. This robust platform is designed to remove stubborn dust and debris from the surfaces of wafers and masks for improved product yield. ES-CLV06 features a specialized rotating brush head with adjustable speed and direction to ensure optimal cleaning performance. The user is able to quickly select from five adjustable cleaning levels, giving the option to customize the cleaning process to best meet specific wafer and mask cleaning needs. E-SUN ES-CLV06 includes a long-lasting and durable steel cleaning brush that provides ample coverage while gently cleaning delicate surfaces. Additionally, this unit features a detachable drying section that aids in eliminating water drops from valuable wafers and masks. ES-CLV06 incorporates a high-precision linear motor that is capable of providing up to 10,000 steps-per-second of scrubbing, allowing for professional and accurate cleaning jobs. The unit is equipped with multiple suction levels so that the user can easily adjust the cleaning force to ensure adequate but gentle cleaning on given wafer or mask surfaces. E-SUN ES-CLV06 is equipped with a robust dust-control system that ensures a safe and secure operational environment during the cleaning process, protecting both the user and the delicate semiconductor surfaces. The efficient cleaning action of ES-CLV06 is also easily integrated with industrial robots and other automated systems for a high-speed, high-end cleaning process. This unit also takes advantage of a low-noise design, allowing for efficient and convenient use in a variety of settings. E-SUN ES-CLV06 is an exceptional wafer & mask scrubber ideal for professional, efficient, and reliable clean-up. This robust unit is designed to improve and promote product yield on a variety of delicate surfaces, featuring multiple adjustable settings and improved dust-control. Furthermore, ES-CLV06 takes advantage of low noise design, while the integrated suction levels guarantee that delicate surfaces remain intact during the cleaning process.