Used ELECTROVERT HS-222 #9064269 for sale

ELECTROVERT HS-222 is a powerful and reliable wafer and mask scrubber designed to remove residual contaminants from substrates during the semiconductor fabrication process. The scrubber uses a patented scrubbing head with a multi-stage cleaning equipment to deliver deep cleaning action and efficient removal of surface impurities. It can be used to remove organic and ionic contaminants, metal oxides, hydrocarbons, and particles from wafer and mask surfaces. HS-222 scrubber has a powerful custom AC motor with adjustable speed and light emitting diode (LED) operation indicators. It has two separate stepper motors that control scrubbing head rotation and pressure, allowing for consistent and reliable performance. The scrubber has adjustable excitation time and substrate contact gap for improved process stability and effective cleaning. The scrubber's design helps protect both the operator and substrate from contamination. It has an ergonomic design with an adjustable and vibration-minimizing scrubbing system. The scrubber is equipped with a sloping scrub table to ensure no material buildup on the substrate. The scrub oscillator is powered with an adjustable frequency to minimize scratching on the surface of the substrates. A triple-point scrubbing head is designed to evenly clean the substrate and eliminate any static charge build-up. To ensure safety and reliable performance, ELECTROVERT HS-222 wafer and mask scrubber is equipped with a cascade air filter. The filter is designed to reduce the risk of breathing any harmful airborne contaminants. Additionally, the scrubber is equipped with a total coverage particle filtration unit to minimize contamination from dust and other particles during scrubbing. The machine also has an adjustable scrubbing speed and frequency control for efficient thermodynamic scrubbing and maximum process stability. Overall, HS-222 scrubber is an effective and reliable wafer and mask scrubber for the semiconductor fabrication process. Its powerful AC motor, adjustable scrubbing head with multi-stage cleaning tool, adjustable excitation time and substrate contact gap, and filtration asset minimize the risk of contamination and ensure efficient and consistent substrate cleaning.