Used G&P TECHNOLOGY 412 #9067722 for sale

G&P TECHNOLOGY 412
ID: 9067722
Post CMP cleaner.
G&P TECHNOLOGY 412 is a wafer and mask scrubber that is often used in the semiconductor industry for cleaning and polishing substrates. The machine is used for removing particles and contaminants that accumulate on the wafer during the polishing process. It utilizes a multi-rotational head to scrub the surface of the wafer in a circular motion while spinning in order to remove the particles. The scrubbing process is aided by a brush and brush pad. The 416 can clean up to twelve 8 inch wafers in one cycle and up to 100 wafers per hour. 412 is a highly efficient cleaning system that allows for the removal of particles and residue without damaging the wafer surface. It features four scrubbing stations that have two cleaning heads each with two, offset, counter-clockwise and clockwise spinning brushes. This allows for a more efficient scrubbing process, as each brush can scrub separately with its own set of scrubbing parameters. The scrubbing parameters are adjustable and the machine is capable of working at various scrubbing speeds to accommodate different wafers. G&P TECHNOLOGY 412 also features a waste management system that allows for the efficient removal of cleaned particles and residue. The machine has a small reservoir that collects the particles and residue that are scrubbed from the wafer. The reservoir prevents contamination of the wafers during the scrubbing process. The machine also features a scrubbing monitor and alarm that registers and records the scrubbing process and alerts operators if something goes wrong. In addition, 412 has an automated cleaning system that helps reduce manual labor and ensures a consistent and efficient cleaning process. It was designed to be user-friendly and easy to operate. G&P TECHNOLOGY 412 is a highly reliable and efficient machine that is easy to maintain and provides an excellent cleaning solution for wafers and masks.
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