Used HUGLE HS-1010 #9099938 for sale

HUGLE HS-1010
Manufacturer
HUGLE
Model
HS-1010
ID: 9099938
Vintage: 1987
Die matrix expander 1987 vintage.
HUGLE HS-1010 wafer and mask scrubber is designed to efficiently and effectively remove contaminants from photomasks and wafers used in the semiconductor, electronics, and optoelectronics industries. This device operates by using highly effective scrubbing heads to gently, yet thoroughly scrub the surface of the masks and wafers. It is efficient and easy to operate, providing excellent surface cleanliness for all products. HS-1010 utilizes two scrubbing heads. The first head is composed of soft bristles that are designed to remove particles and contaminants from the mask or wafer surfaces without leaving any scratches or other damage. The second head is designed to apply solvents (usually isopropyl alcohol) to the surface, dissolving and solid contaminants while facilitating the cleaning process. HUGLE HS-1010 offers three speeds (high, medium, and low), allowing the operator to choose the most appropriate speed for the specific cleaning process. The high speed is best used for removing stubborn debris, while lower speeds can be selected to gently clean delicate surfaces. This device is also equipped with an adjustable time feature, allowing the operator to choose the optimal scrubbing time. This ensures that the perfect balance between cleaning power and avoiding overscrubbing is achieved. HS-1010 also comes equipped with a fully automatic operating cycle, eliminating the need for the operator to manually control the process. This feature automatically turns the device on and off and sets the appropriate speed and time settings, ensuring that the best cleanliness is achieved. HUGLE HS-1010 is designed to optimize productivity in cleanroom environments. It is lightweight and easy to move around the room, and features a low-noise operation, providing a clean and comfortable working environment. In summary, HS-1010 wafer and mask scrubber is a highly effective and reliable device for the cleaning of photomasks and wafers used in the semiconductor, electronics, and optoelectronic industries. This device offers various cleaning modes, adjustable time settings, and automatic operating cycles, enabling the user to choose the appropriate speed and time to achieve the best surface cleanliness. Its lightweight and low-noise design make it ideal for use in cleanroom environments, allowing for quick and easy cleaning with minimal disruption to other activities.
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