Used HUGLE HS-1810 #9237160 for sale

HUGLE HS-1810 is a fully automated wafer and mask scrubber used for the cleaning of wafer and mask surface substrates. This scrubber is equipped with two high-pressure 10,000 RPM cleaning nozzles that spray high-pressure jets of deionized water for effective surface cleaning of wafer and mask substrates. HS-1810 features a bi-directional scrub brush that works in conjunction with the cleaning nozzles to provide a more thorough cleaning. The scrub brush removes any residual particles from the surface that can not be cleaned with the pressure nozzles alone. This powerful combo effectively cleans the surface of the substrates, resulting in higher quality products. HUGLE HS-1810 is designed with an optimized air flow equipment that reduces the concentration of IPA vapours. IPA is a cleaning agent and it is important to be aware of the vapours produced by it during operation as high concentrations of vapours can be hazardous. This is avoided as HS-1810's air-flow system is designed to circulate the IPA vapours within the unit rather than to be released into the environment. HUGLE HS-1810 is a robust and solid machine with a stainless steel water tank and anodized aluminum body. It is designed with a wide working platform that can accommodate substrates up to 450 x 600mm in size. The platform can move in all directions for better cleaning convenience. This scrubber is also equipped with a highly precise temperature and pressure control machine to ensure the proper output of IPA and deionized water for various types of substrates. HS-1810 is user friendly. It has an intuitive color touch panel with a graphical control tool that allows for easy water Pressure and temperature settings. Its intuitive user interface makes it easier to set up and operate the machine with minimal training. Overall, HUGLE HS-1810 is a reliable, efficient scrubber for the cleaning of wafer and mask substrates. Its robust design, optimized air flow asset, and user friendly interface make it a great choice for any cleanroom environment.